We have performed seminal work on several plasma polymerization systems. We described the formation of the interface during the deposition of low permittivity fluoropolymer films with Prof. E. Sacher (Engineering Physics, Ecole Polytechnique, Montreal), and developed a semi-conducting plasma polymer film, an ultrathin organo-inorganic hybrid plasma polymer pervaporation membrane with Prof. M. Narkis (Chemical Engineering, Technion), and a laser-sensitive plasma polymer film for micromachining integrated circuit prototypes with Chip Express Inc.
Schematic illustrations of a standard parallel plate rf plasma polymerization reactor and a parallel plate rf plasma polymerization reactor with the capability for sputter deposition without breaking vacuum.Schematic illustrations of a standard parallel plate rf plasma polymerization reactor reactor and a parallel plate rf plasma polymerization reactor with the capability for sputter deposition without breaking vacuum.Organic-inorganic hybrid plasma polymer film on a porous membrane substrate, before deposition.Organic-inorganic hybrid plasma polymer film on a porous membrane substrate, after deposition.Schematic of integrated circuit prototype before laser micromachining. The plasma polymer films is the blue layer.Schematic of integrated circuit prototype after laser micromachining. The plasma polymer films is the blue layer.Plasma polymer film following laser micromachining, top view.Plasma polymer film following laser micromachining, cross-section.
